English to Polish Science Chemistry; Chem Sci/Eng

Excess exposure will result in creeping of the
exposure leading to line broadening, but also indiscriminate
thinning of the resist. When the resist becomes
thinned over the non-exposed area of the glass,
breakthrough during chemical etching becomes prevalent,
leading to localised surface damage and loss of
channel integrity.

Teskt o naświetlaniu fotorezystu